Equipment

Feel free to contact us if you are interested in using our equipment or collaborating.

Spectrophotometer	Lambda 750 UV/Vis/NIR Wavelength range from 190 to 3300 nm Measure specular and diffuse reflectance and transmittance
Probe Station with Semiconductor Analyzer	Keysight B1500A with probe station Current range from .1 fA to 1 A Voltage range from .5 um to 200 V Frequency range from 1 kHz to 5 MHz
Chemical Vapor Deposition Systems	Three custom built systems One zone and two zone furnaces Grow carbon nanotubes; dope carbon nanotubes Grow silicon nanowires Grow transition metal dichalcogenides Grow III-V and II-VI nanomaterials
Manual Spinners	Laurell Programmable recipes Up to 5" wafer Maximum speed is 12000 rpm
Plasma Cleaner	Diener Ar and O gas Pressure 0 to 200 mTorr Power 0 to 50 W
Centrifuge	Unico Powerspin 2 to 15 mL tubes Relative centrifugal force up to 1750 g's
Linear Abraser	Taber Eleven stroke lengths from .2" to 4" Variable stroke speed from 2 to 75 cycles per minute Variable load from 350 to 2100 grams
Ultrawater Purifier	Millipore Resistivity 18.2 MOhm-cm at 25 C